Tescan’s participation will feature three highlights: its integrated semiconductor failure analysis workflow, a technical forum presentation on gas-assisted femtosecond laser sample preparation, and the interactive SPIN. MATCH. ENJOY. booth activity.
Tescan at the Event
September 2–4, 2026 | Booth R8201, 4F, TaiNEX 2
Explore a correlative workflow that connects non-destructive micro-CT inspection, femtosecond laser access, plasma FIB-SEM sample preparation, and 4D-STEM analysis. The workflow follows four stages - Inspect, Access, Prepare, and Analyze - to support defect localization and reliable downstream characterization across multiple scales.
September 2-3, 2026 | From 10:00 | Booth R8201
Spin the wheel, match each Tescan technology with its signature drink, and discover its role in the semiconductor workflow. The activity provides a concise introduction to non-destructive inspection, laser access, and FIB-SEM sample preparation, with Tescan specialists available to discuss each stage.
September 4, 2026 | 15:05–15:30 | Room 402, 4F, TaiNEX 1
Presentation: Tescan FemtoChisel™: From Hours to Minutes: High-Throughput Gas-Assisted Femtosecond Laser Workflows for Advanced Semiconductor Analysis and Characterization
Speaker: Dr. Herve Mace, Semiconductor Solution Sales Development Director
What You Will Learn
- Where micro-CT, femtosecond laser processing, plasma FIB-SEM, and 4D-STEM fit within the Inspect → Access → Prepare → Analyze workflow.
- How in-situ micro-CT supports non-destructive internal inspection and warpage analysis before physical sample preparation.
- How gas-assisted femtosecond laser processing supports cross-sectioning, decapsulation, delayering, cavity preparation, and large-volume material removal.
- How real-time SEM-guided FIB-SEM preparation and 4D-STEM analysis support site-specific preparation and downstream characterization.
Why Attend
The exhibition and forum provide complementary perspectives on semiconductor failure analysis: an integrated workflow across multiple length scales and a focused technical session on femtosecond laser sample preparation.
Visit Tescan to compare approaches, ask application-specific questions, and discuss how these methods could fit into your current laboratory workflow.
