Tescan opens new Korea demo lab supporting semiconductor analysis
Tescan offers on‑site demos in a new scanning electron microscopy lab in Korea, supporting the semiconductor industry, research institutions and universities with FIB‑SEM expertise.
WEBINAR | Correlated Microanalytical Workflows for Particle Analysis Using Automated Mineralogy, FIB-SEM and SIMS
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Tescan offers on‑site demos in a new scanning electron microscopy lab in Korea, supporting the semiconductor industry, research institutions and universities with FIB‑SEM expertise.
Carlyle and other shareholders have entered into an agreement with Shimadzu Corporation that may result in a change in Tescan’s shareholding structure, subject to approvals.
Tescan introduces the FemtoChisel femtosecond laser platform, delivering faster, more precise semiconductor sample preparation and integrated workflow performance.
Interview with Jean-Charles Chen, CEO of Tescan Group: Unveiling a New Era of Discovery
Discover how FemtoChisel™ laser solutions enable precise and efficient sample preparation workflows, supporting advanced microscopy and materials analysis.
Learn how integrating low-energy argon ion beam cleaning with Ga+ FIB-SEM improves (S)TEM sample preparation by reducing damage and enabling high-quality nanoscale analysis.
Learn the fundamentals of electron microscopy, including how SEM, TEM, and STEM work, how images are formed, and what signals reveal about materials at the nanoscale.
An interview on CEITEC Nano infrastructure, plasma FIB-SEM with SIMS, and advanced materials workflows using Tescan AMBER X 2.
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