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UHR SEM with TriLens™ immersion optics for the ultimate characterization of nanomaterials

Tescan MAGNA

MAGNA
MAGNA

Tescan MAGNA is designed for high-performance surface characterization of nanomaterials. Its Triglav™ SEM column delivers ultra-high-resolution imaging, particularly at low beam energies, and the integrated In-Beam detection system enables energy-filtered and angle-resolved backscattered electron contrast.

The Tescan Essence™ interface offers a customizable, intuitive environment with dedicated modules for streamlined operation.

  • Ultra-high resolution and high-contrast imaging of next-gen materials

  • Unique TriBE™ and TriSE™ detection for advanced nano characterization

  • Optimal imaging and analytical conditions guaranteed by Tescan In-Flight Beam Tracing™

Where Tescan MAGNA™

makes the difference

Sub-nanometer Resolution Across All Voltages

The Triglav™ SEM column delivers crisp, ultra-high-resolution imaging down to 0.5nm at 30 keV, ensuring accurate visualization of even the finest nanostructures.

Flexible SEM and STEM Imaging in One Platform

Observe surface topography and internal features with SEM and STEM, enabling comprehensive characterization of nanoparticles, nanotubes, and porous frameworks.

High-Contrast Detection for Complex Materials

The TriSE and TriBSE detection system provides selective energy and angular filtering, revealing structural and compositional details in black silicon, catalytic materials, and other challenging samples.

Effortless Imaging Setup and Switching

With In-Flight Beam Tracing™ and automated beam alignment, researchers can rapidly establish optimal conditions and transition between imaging and analytical modes without workflow interruptions.

Safe, Multi-User SEM Operation

Essence™ software with a live 3D collision model ensures straightforward operation, making MAGNA safe to operate instrument.

Automation and Scripting for Advanced Workflows

Use VisualCoder SEM automation or the SEM Expert PI to standardize workflows, automate repetitive tasks, and or prototype new experiments.

Tescan MAGNA Applications

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Tescan MAGNA in Materials Science

Tescan MAGNA is designed for researchers pushing the boundaries of science. Whether it’s imaging delicate porous frameworks, analyzing nanoparticle dispersions, or resolving complex nanostructures, MAGNA delivers clarity and precision at the sub-nanometer scale.

  • High-contrast nanoparticle imaging with TriSE and TriBSE detection systems
  • In-Flight Beam Tracing™ for effortless, repeatable imaging and rapid condition switching
  • Safe, multi-user operation enabled by Essence™ software and live 3D collision modeling
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Tescan MAGNA™

Technical specification

Electron Optics 

Electron Beam Column 

Triglav™ UHR-SEM Column 

Electron Source 

Schottky field electron emitter 

Electron Beam Resolution 

  • 1.2 nm @ 1 keV

  • 0.9 nm @ 1 keV with sample bias (BDT)

  • 0.6 nm @ 15 keV

  • 0.5 nm @ 30 keV STEM

Magnification 

4x to 2,000,000x 

Electron Beam Landing Energy Range 

200 eV - 30 keV (< 50 eV with BDT) 

Probe Current 

2 pA – 400 nA (continuosly adjustable) 

Detectors 

Standard Detectors 

  • SE detector (Everhart-Thornley chamber detector)

  • In-column SE/Mid-Angle BSE detector (InBeam SE/Mid-Angle BSE)

  • In-column BSE detector with energy filtering (In-Beam f-BSE)

  • Chamber View IR Camera

Optional Detectors* 

  • LE-BSE detector (low-energy, scintillator type, mot.)

  • 4Q LE-BSE detector (low-energy, solid state, 4 quadrants, mot.)

  • R-BSE detector (scintilator type, mot.)

  • HADF R-STEM (BF, DF, HADF, mot.; holder for up to 8 grids)

  • CL detectors

  • Optical Navigation and Correlation Camera (ONCam)

  • GSD (Gaseous Secondary electron Detector)

Optional Analyzers* 

  • Tescan (Dual) Essence EDS (integrated)

  • 3rd party EDS

  • 3rd party EBSD

  • 3rd party WDS

  • Confocal Raman microscope with spectrometer (RISETM)

Accessories 

  • pA meter incl. touch alarm function

  • Integrated Plasma Cleaner (Decontaminator)

  • Beam Deceleration Technology (BDT)*

  • Electrostatic Beam Blanker*

  • Electron Beam Lithography package*

  • Load Lock (manual or motorized)*

  • Stage Extensions and modifications*

Stage & Sample 

Chamber type 

GM chamber (20+ ports)**  

Stage 

Motorized, 5-axis compucentric stage 

X & Y axis travel range 

130 mm 

Z axis travel range 

96 mm 

Rotation 

Compucentric, 360° (continuous) 

Tilt range 

Compucentric, -70° to +90° 

Max. specimen height 

92 mm (133 mm without stage rotation) 

Max. specimen size 

180 mm diameter with full XY moves, rotation, no tilt (larger samples possible with limited stage travel and rotation) 

Maximum specimen weight 

  • 8,000 g (full XYZ moves)
  • 1,000 g (full XYZRT moves)
Vacuum system 

Pump types

Oil-free 

Vacuum options 

MultiVac mode (up to 500 Pa (N2 or H2O) 

*Optional and other detectors, analyzers and accessories available upon request 
 **Different chamber type available upon request 

Electron Optics 

Electron Beam Column 

Triglav™ UHR-SEM Column 

Electron Source 

Schottky field electron emitter 

Electron Beam Resolution 

  • 1.2 nm @ 1 keV

  • 0.9 nm @ 1 keV with sample bias (BDT)

  • 0.6 nm @ 15 keV

  • 0.5 nm @ 30 keV STEM

Magnification 

4x to 2,000,000x 

Electron Beam Landing Energy Range 

200 eV - 30 keV (< 50 eV with BDT) 

Probe Current 

2 pA – 400 nA (continuosly adjustable) 

Detectors 

Standard Detectors 

  • SE detector (Everhart-Thornley chamber detector)

  • In-column SE/Mid-Angle BSE detector (InBeam SE/Mid-Angle BSE)

  • In-column BSE detector with energy filtering (In-Beam f-BSE)

  • Chamber View IR Camera

Optional Detectors* 

  • LE-BSE detector (low-energy, scintillator type, mot.)

  • 4Q LE-BSE detector (low-energy, solid state, 4 quadrants, mot.)

  • R-BSE detector (scintilator type, mot.)

  • HADF R-STEM (BF, DF, HADF, mot.; holder for up to 8 grids)

  • CL detectors

  • Optical Navigation and Correlation Camera (ONCam)

  • GSD (Gaseous Secondary electron Detector)

Optional Analyzers* 

  • Tescan (Dual) Essence EDS (integrated)

  • 3rd party EDS

  • 3rd party EBSD

  • 3rd party WDS

  • Confocal Raman microscope with spectrometer (RISETM)

Accessories 

  • pA meter incl. touch alarm function

  • Integrated Plasma Cleaner (Decontaminator)

  • Beam Deceleration Technology (BDT)*

  • Electrostatic Beam Blanker*

  • Electron Beam Lithography package*

  • Load Lock (manual or motorized)*

  • Stage Extensions and modifications*

Stage & Sample 

Chamber type 

GM chamber (20+ ports)**  

Stage 

Motorized, 5-axis compucentric stage 

X & Y axis travel range 

130 mm 

Z axis travel range 

96 mm 

Rotation 

Compucentric, 360° (continuous) 

Tilt range 

Compucentric, -70° to +90° 

Max. specimen height 

92 mm (133 mm without stage rotation) 

Max. specimen size 

180 mm diameter with full XY moves, rotation, no tilt (larger samples possible with limited stage travel and rotation) 

Maximum specimen weight 

  • 8,000 g (full XYZ moves)
  • 1,000 g (full XYZRT moves)
Vacuum system 

Pump types

Oil-free 

Vacuum options 

MultiVac mode (up to 500 Pa (N2 or H2O) 

*Optional and other detectors, analyzers and accessories available upon request 
 **Different chamber type available upon request 
MAGNA 2

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Where can you find us: 

Tescan
Libušina třída 21
623 00 Brno
Czech Republic

130405923 us US 37.09024 -95.712891 25.3575 29.349345 20.67957527 42.082797 39.91384763 -33.693421 13.93320106 3.039986586 31.997988 38.050985 47.579533 30.052597 48.1485965 58.375799 54.663142 19.195447 56.975106 47.916997 50.493053 45.868592 10.79556993 44.35660598 43.2371604 55.536415 14.557577179752773 32.100937 -6.116829 -6.212299277967318 33.600194 -12.08688 23.7104 -33.471062 31.998740087 -23.69149395 43.462349 51.529848 49.1893523 49.197486 25.072375 31.075811 1.299027 40.676979 52.30150662 51.013813 35.684121 37.566531 52.246622 40.581349 39.911632 -26.1811371 41.818215 33.429928

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