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Discover Tescan’s

FemtoChisel™
Femtosecond Laser for High-Precision Semiconductor Sample Prep

Tescan FemtoChisel™ gives you nanometer-level precision and high-throughput intelligent laser processing for semiconductor research and failure analysis. It delivers pristine surfaces while significantly reducing the need for subsequent FIB polishing. Accelerate turnaround in device analysis and failure investigation for current and next-generation semiconductor materials.
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Tescan FemtoChisel™

Achieve Pristine Laser Surfaces for Faster Semiconductor Analysis 

Tescan FemtoChisel™ is a femtosecond laser micro and nano machining system for sample preparation, micro and nano fabrication, failure analysis, and surface modification. Designed for semiconductor, glass processing, materials research, and biomedical device manufacturing workflows, it helps users access buried regions of interest, prepare clean surfaces, and accelerate analysis.

Key benefits  

  • Intelligent Multi-Gas Processing

  • Laser Protective Layer

  • Multi degrees of freedom stage with tilt and wafer-level rotation

  • Correlative Machine Vision & Targeting

  • Software-Selectable Laser Wavelength

  • Real-time surface and ablation monitoring with material adaptability
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Where can you find us:

Tescan 
159 Discovery Dr, Storrs
06269, Connecticut
United States
130405923 us US 37.09024 -95.712891 25.3575 29.349345 20.67957527 42.082797 39.91384763 -33.693421 13.93320106 3.039986586 31.997988 38.050985 47.579533 48.1485965 58.375799 54.663142 19.195447 56.975106 47.916997 50.493053 45.868592 10.79556993 44.35660598 43.2371604 55.536415 14.557577179752773 32.100937 -6.116829 -6.212299277967318 33.600194 -12.08688 23.7104 -33.471062 31.998740087 -23.69149395 43.462349 51.529848 49.1893523 49.197486 25.072375 31.075811 1.299027 40.676979 52.30150662 51.013813 35.684121 37.566531 52.246622 40.581349 39.911632 -26.1811371 41.818215 33.429928

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