Semiconductor Failure Analysis Workflows
Explore how Tescan connects non-destructive inspection, targeted access, sample preparation and high-resolution analysis for advanced packaging and failure analysis challenges.
Meet Tescan at the International Symposium for Testing and Failure Analysis (ISTFA).
Organized by ASM International, ISTFA brings together the semiconductor failure analysis community to share the latest methodologies, technologies, and best practices.
Booth #605
October 4-8, 2026 | San Antonio, Texas, United States
Explore how Tescan connects non-destructive inspection, targeted access, sample preparation and high-resolution analysis for advanced packaging and failure analysis challenges.
Discover application images, videos and real examples showing what Tescan technologies can reveal, access and prepare, including deeply buried regions and complex material stacks.
Learn about the latest developments across Tescan’s semiconductor workflow, from defect localisation and laser-enabled access to FIB-SEM preparation and downstream analysis.
Bring your failure-analysis or packaging question to the booth. Our semiconductor application experts are ready to discuss your sample, workflow bottlenecks and possible next steps.
February 27, 12:45 - 13:45, LL Copernicum, level 0
February 27, 12:45 - 13:45, LL Copernicum, level 0
February 27, 12:45 - 13:45, LL Copernicum, level 0
February 27, 12:45 - 13:45, LL Copernicum, level 0
February 27, 12:45 - 13:45, LL Copernicum, level 0
February 27, 12:45 - 13:45, LL Copernicum, level 0
12:45 PM - 01:45 PM
February 27, 2023
February 27, 12:45 PM - 01:45 PM, booth 123
Introducing MIRA XR – the analytical SEM reimagined for speed, usability, and ultra-high-resolution imaging. Perfect for analytical workflows across materials science disciplines. Designed to deliver high throughput without compromising on resolution or automation. A productivity platform for every user, from QA labs to advanced research teams.
Located at TESCAN's Booth 1324
Register for a short in-booth session.
Femtosecond Precision. Analysis-Ready Results.
You can Book a Demo directly at Tescan Booth N. 605
15:20 - 15:40
October 6, 2026
15:00 - 16:00
October 7, 2026
15:00 - 16:00
October 7, 2026
October 6, 15:20 - 15:40, Bridge Hall
October 7, 15:00 - 16:00, Exhibit Hall
October 7, 15:00 - 16:00, Exhibit Hall
Semiconductor Business Development (Global)
Semiconductor Product Marketing
Semiconductor Business Development (North America)
FIB-SEM Business Development (North America)
Head of Technology - Laser Solutions
Product Sales Lead - Laser Solutions
Product Sales Lead - STEM Solutions
Vice-President of Sales (Americas)
Sales Manager (US Northwest)
Sales Manager (US Southwest)
Area Sales Director (Singapore)
No distributors found.
ISTFA 2026 is the 52nd International Symposium for Testing and Failure Analysis, bringing together semiconductor professionals to discuss tools, methods, and research for device testing, failure analysis, reliability, and advanced packaging.
Tescan will showcase integrated semiconductor failure analysis workflows, connecting defect localisation, rapid sample access, site-specific preparation, high-resolution imaging and root-cause analysis.
Explore application examples from across the workflow, including non-destructive Micro-CT inspection, FemtoChisel™ laser-enabled access, FIB-SEM sample preparation and imaging, and TENSOR applications for advanced electron microscopy analysis of semiconductor materials and devices.
Visitors can explore Tescan’s full semiconductor workflow, connecting non-destructive 3D inspection with micro-CT, rapid access to buried features with FemtoChisel™ femtosecond laser processing, precise delayering and sample preparation with FIB-SEM, high-resolution SEM imaging, and advanced nanoscale characterization with TENSOR™ S/TEM. Together, these technologies provide a connected path from defect localization and access to preparation, imaging, and root-cause analysis.
Attendees can explore Tescan’s integrated semiconductor failure analysis workflows, from defect localization and rapid access to site-specific sample preparation, high-resolution imaging, and root-cause analysis. Visit Booth #605 to discover technologies including FemtoChisel™, SOLARIS™, AMBER X™ 2, and TENSOR™ S/TEM, and speak with Tescan experts about practical approaches to improving failure analysis efficiency for advanced semiconductor devices and packaging.
FIB-SEM and micro-CT are used for high-resolution imaging, 3D analysis, and sample preparation, enabling detailed characterization of materials across multiple length scales.