Tescan CLARA and the Nanoprototyping Toolbox^TM

Tescan CLARA is an ultra high-resolution SEM built for advanced imaging and nanoprototyping. It combines ultra-stable optics, versatile detection, and integrated prototyping tools, supporting both analytical research and device fabrication inside a single instrument.

Sub-nanometer imaging resolution at low beam energies

Multi-detector system for SE, BSE, STEM, EDS, EBSD, and CL

Integrated EBL kit, DrawBeam, SEM Expert PI, and VisualCoder for nanoprototyping

Use of a large variety of precursors via the Tescan OptiGIS gas delivery system

Tescan Essence™ interface for automation and reproducibility

WHERE TESCAN CLARA MAKES THE DIFFERENCE in nanoprototyping

Ultra High-resolution imaging

Achieve 0.9 nm resolution at 15 keV and 1.0 nm at 1 keV with beam deceleration, enabling clear observation of nanoscale structures.

Analytical versatility

Combine SE, BSE, STEM, EDS, EBSD, and CL detection in one environment for comprehensive material characterization.

Nanoprototyping workflows

Prototype novel devices at the nanoscale directly inside the microscope using EBL kit, DrawBeam deposition, SEM Expert PI, and VisualCoder automation.

Stable platform

Rigid column design minimizes drift and ensures reproducible imaging during long acquisitions.

Efficient navigation

Wide Field Optics™ simplifies movement from overview scans to fine structural details.

Wide range of functional materials

Tescan OptiGIS enables a large variety of precursors for deposition or etching of materials at the nanoscale.

Safe and intuitive operation

Essence™ software with 3D collision protection supports multi-user environments and reduces training time.

Tescan CLARA

IN MATERIALS SCIENCE

3D Nanoprinting for the next generation of devices

Deposit complex 3D structures via standard FIB-SEM

See application

Avalanche detector - single photon detector for plasmonics research

Direct-write fabrication of silver nanoarrays using Tescan’s integrated EBL solution.

See application

Tescan Nanoprototyping Toolbox™

fOR RAPID PROTOTYPING and automation

Nanoprototyping ToolboxTM enables precise prototyping at nanoscale combines with advanced automation via Python scripting and visual programing

Electron beam lithography via EBL kit
Python scripting for tailored imaging sequences through SEM Expert PI
No-code workflow builder for routine or repetitive tasks via VisualCoder
Precise deposition and etching via DrawBeam and OptiGIS

Unlocked content

Why Choose Tescan CLARA 2

for Nanoscale Prototyping?

Demonstrate Measurable Gains in Photon Detection Efficiency

SEM image of the resulting spiral ball structure fabricated using the layer-by-layer FEBID process demonstrating the precision and complexity achievable with proximity-effect-corrected deposition

[Left] Result of the height calibration test. [Right] Result of the sigma calibration test. Both datasets are used to calibrate the growth rate parameters for the final 3D deposition process.

Get the most out of Tescan

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TESCAN CLARA for Nanoprototyping

Technical specification

Electron Optics & Imaging	BrightBeam™ field-free UHR SEM column with beam deceleration
	Schottky FEG electron source
	Resolution: 0.9 nm @ 15 keV (SE), 1.2 nm @ 1 keV (with BDT)
	Magnification range: 2× to 2,000,000×
	Probe current: 2 pA – 400 nA
Vacuum System	High and low vacuum modes with MultiVac™
Vacuum System	Beam Deceleration Technology for low-kV imaging
Stage & Chamber	5-axis motorized Compucentric stage
	Max sample size: 100 mm diameter
	Integrated IR camera and live 3D collision model
Detection	In-column SE and BSE detectors with energy filtering
	E-T detector for surface topography
	STEM and CL detector compatibility
	EDS / EBSD support
Software & Automation	Essence™ interface for control and workflow management
	In-Flight™ automated beam alignment and parameter optimization
	SEM Expert PI for scripted imaging routines
	VisualCoder™ for no-code workflow automation

Electron Optics & Imaging

BrightBeam™ field-free UHR SEM column with beam deceleration

Schottky FEG electron source

Resolution: 0.9 nm @ 15 keV (SE), 1.2 nm @ 1 keV (with BDT)

Magnification range: 2× to 2,000,000×

Probe current: 2 pA – 400 nA

Vacuum System

High and low vacuum modes with MultiVac™

Beam Deceleration Technology for low-kV imaging

Stage & Chamber

5-axis motorized Compucentric stage

Max sample size: 100 mm diameter

Integrated IR camera and live 3D collision model

Detection

In-column SE and BSE detectors with energy filtering

E-T detector for surface topography

STEM and CL detector compatibility

EDS / EBSD support

Software & Automation

Essence™ interface for control and workflow management

In-Flight™ automated beam alignment and parameter optimization

SEM Expert PI for scripted imaging routines

VisualCoder™ for no-code workflow automation

GET IN Touch

Where can you find us:

Tescan
Libušina třída 21
623 00 Brno
Czech Republic

130405923 us US 37.09024 -95.712891 25.3575 29.349345 20.67957527 42.082797 39.91384763 -33.693421 13.93320106 3.039986586 31.997988 38.050985 47.579533 48.1485965 58.375799 54.663142 19.195447 56.975106 50.493053 45.868592 10.79556993 44.35660598 43.2371604 55.536415 14.557577179752773 32.100937 -6.116829 -6.212299277967318 23.7104 -33.471062 31.998740087 -23.69149395 43.462349 51.529848 49.1893523 49.197486 25.072375 31.075811 1.299027 40.676979 52.30150662 51.013813 35.684121 37.479653 52.246622 40.581349 39.911632 -26.1811371 41.818215 33.429928 -12.08688

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Tescan CLARA and the Nanoprototyping ToolboxTM