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WEBINAR | Nanoscale Prototyping with Advanced SEM Capabilities

Turn your SEM into a nanofabrication powerhouse. Learn how researchers are patterning, depositing, and etching at the nanoscale–fast–using Tescan’s Nanoprototyping Toolbox and advanced SEM workflows.

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Why watch ondemand 

Our guests show real projectsfrom gas sensors to plasmonic structures and transparent modified substrated for embryonal cell studies and share the tricks, tips, and pitfalls so you can reproduce the results in your own lab. 

Runtime: ~60 minutes          Format: Talk + Live Q&A highlights  

What You'll Learn: 

  • SEM for rapid prototyping: How we combine scanning electron microscope (SEM) imaging  and patterning via dose modulation, design alignment, and feature placement for reliable nanoscale patterning. 
  • Largearea patterning, minus the pain: Practical ways to handle field stitching and continuity when your structures are electrically simple (e.g., contacts, electrodes, heaters, sensitive areas). 
  • FEBID deposition use cases: how to utilise SEM with an OptiGIS to create functional devices to help with your research. 
  • Biological substrates, done right: Why embryonal cell favor certain pattern and how to prepare such substrates using standard SEM and stages with relaxed stitching tolerances, plus how to size features for optical inspection. 
  • Plasmonics in the real world: Why fabricated gains can differ from simulation (material choice, postprocessing, thermal effects) and how to recover sharper, higherQ structures. 
  • Upgrade path you can use now: Add the Nanoprototyping Toolbox to any Tescan Generation 4 microscope running Essence - including VEGA, MIRA, CLARA, and MAGNA. 

Who should watch 

  • Nanofabrication and lithography researchers 
  • Device physicists and sensor developers 
  • Core facility managers seeking higher SEM utilization 
  • Materials & bioengineering groups needing fast design-build-test cycles 
  • Master’s and phd students, starting their research, trying to test their ideas as fast as possible 

 

Agenda at a glance 

  1. From design to device: SEM patterning workflows 
  2. Patterning at scale: Managing alignment, field size, and stitching
  3. Deposition & etch: FEBID tips for sharper features
  4. Use cases: Gas sensors, transparent substrates for embryonal cells study, plasmonic devices, metalense optics, AFM tip modifications and magnetic research
  5. Tooling & automation: Scripting for repeatability and throughput
  6. Q&A highlights: Audience questions on purity, stitching accuracy, and more 

Meet the speaker

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Alessandro Cian

Physicist with a background in condensed matter physics from the University of Trieste, currently works as a researcher with a focus on lithographic platforms and expertise in micro- and nanofabrication at the Center for Sensors & Devices of Fondazione Bruno Kessler. In order to facilitate the development of sensing technologies, he develops and optimizes UV, electron beam (EBL), and ion beam (IBL) lithography processes.

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Milos Hrabovsky

Physicist with a master’s degree in applied physics, currently works as Product Marketing Manager for Nanoprototyping at Tescan, with a focus on electron and ion beam patterning, deposition, and etching processes, as well as automation through scripting. Leveraging prior experience as an R&D Application Specialist in electron beam lithography and focused ion beam patterning, he brings extensive expertise in SEM/FIB applications for nanofabrication. 

Unlocked content

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Nanoscale Prototyping with Advanced SEM Capabilities

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