Precise Multi-Ion Implantation for Discovering Full Spectrum of New Materials Possibilites
Tescan QuiiN (Quantum Ion Implanter at Nanoscale) is a versatile ion beam system designed for implantation applications. This last generation of platforms is crucial for the next phase of quantum computing revolution, which requires precisely placed ions within material structures.
QuiiN combines an electrostatic SEM for region localization and one of our two new FIB columns designed for implantation. The Veloce column allows the implantation of specific isotopes of gold, germanium, or silicon using a Wien filter. The iVeloce column, also equipped with a Wien filter, enables the use of various gases such as nitrogen, argon, oxygen, helium, xenon, or gas mixtures like CO2. Both columns feature a new beam current meter for precise dose implantation.
