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Tescan MIRA XR™ for Materials Science

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Achieve consistent, ultra-high-resolution imaging and fast EDS analysis across diverse materials with Tescan MIRA XR™. Gain reliable results through advanced beam stability, intelligent automation, and adaptable vacuum modes to make every workflow precise, efficient, and easy to manage.

  • BrightBeam™ technology for nanometer-scale details
  • In-Flight Beam Tracing™ for optimized, repeatable imaging
  • Wide Field Optics™ for effortless navigation across scales
  • Dual Essence™ EDS for fast, accurate chemical analysis
  • MultiVac™ mode for reliable imaging of challenging samples
  • VisualCoder™ automation to cut operator workload by up to 80%

Main Benefits of TESCAN MIRA XR™

for Materials Science Workflows

Reproducible Nanometer-Scale Imaging

Achieve consistent, ultra-high-resolution results across users and sessions with BrightBeam™ technology and In-Flight Beam Tracing™, ensuring stable beam conditions and repeatable imaging quality.  

Confident Imaging of Challenging Samples

Capture reliable images of charging, porous, or beam-sensitive materials in MultiVac™ low-vacuum mode. No coating is required.  

Fast, Accurate Chemical Mapping

Double your EDS throughput with Dual Essence™ EDS, providing precise multi-element maps and reduced shading for efficient compositional analysis.

Streamlined and Automated Workflows 

Simplify complex imaging tasks with VisualCoder™ automation, allowing intuitive drag-and-drop workflow creation that reduces operator time by up to 80%.  

Effortless Navigation Across Scales

Move seamlessly from large-area overviews to nanoscale details with Wide Field Optics™, accelerating orientation and reducing time-to-data.  

EBSD-Ready Crystallographic Analysis 

Combine large-area and nanoscale EBSD mapping in one workflow, supported by Tescan MIRA XR™’s stable beam conditions and wide analytical chamber for comprehensive crystallographic studies. 

TESCAN MIRA XR™

in materials science
03_Analytical points and line profile laid across the garnet-2

Simplify SEM-EDS Petrological Analysis of Complex Rock Samples

Use Tescan SEMs with Dual Essence™ EDS to perform integrated SEM-EDS analysis that resolves zonation and overlapping phases in complex geological samples.

See application
01_Image of homogeneous nanofibrous mesh after process parameters optimization-Nov-26-2025-12-46-28-1797-PM

High-Resolution SEM for Quality Assessment of Electrospun Nanofibers

Tescan MIRA XR™ enables non-destructive imaging of fiber morphology and diameter across polymer meshes.

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03_Detailed ultra-high resolution image of mesoporous silica SBA-15 using Axial detector at 800 eV using Beam Deceleration-1

Morphology of Mesoporous Silica Revealed by Low-kV SEM Imaging

Tescan MIRA XR™ provides high-resolution insight into SBA-15 particle shape and structure.

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Essence™ Image Snapper

AUTOMATED IMAGE ACQUISITION FOR REPRODUCIBLE MATERIALS ANALYSIS

Essence™ Image Snapper automates image collection across multiple regions of interest, ensuring every dataset is captured under consistent, optimized conditions. Integrated into the Essence™ environment, it reduces operator input and speeds up data acquisition for morphology, composition, and defect analysis.

With unattended batch routines, Image Snapper delivers reproducible, high-quality SEM images for standardized materials research and quality control.

It also supports panorama creation, automatically stitching images into seamless large-area overviews. This is ideal for studying microstructural uniformity and contextualizing nanoscale features within broader sample regions.

Essence_Image_Snapper_(1)
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Why Choose TESCAN MIRA XR™

for Materials Science

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TESCAN MIRA XR™ for Materials Science

Technical specification
Tescan MIRA XR™ UHR SEM-EDS for Materials Science
Specifications shown are based on the GM chamber configuration.

Ultra-high resolution BrightBeam™ FE-SEM column

Resolution:
• 0.8 nm @ 30 keV (STEM detector)
• 1.0 nm @ 15 keV
• 1.5 nm @ 1 keV
• 1.4 nm with sample bias (BDT)
• 1.7 nm @ 500 eV

Magnification range from 1× to 2,000,000×

Essence™ integration for SEM and EDS in one interface

Elemental mapping, line scans, and point analysis included

Wide Field Optics™ for SEM navigation from 1×

Essence™ 3D Collision Model for chamber visualization and protection

MultiVac low vacuum imaging up to 500 Pa

5-axis motorized stage with max sample size of 335 × 280 × 133 mm³ and load capacity up to 8 kg

20+ chamber ports ready for detector upgrades
Included & Optional Accessories

Dual Essence™ EDS detectors for high-speed mapping

In-Column Axial detector for high-efficiency ultra-high resolution imaging

EBSD detector for crystallographic analysis from large maps to nanoscale

STEM detector for transmission imaging at sub-nanometer resolution

VisualCoder™ and SEM Expert PI for workflow automation and customization

VisualCoder for workflow automation and SEM Expert PI for advanced automation and scripting
Tescan MIRA XR™ UHR SEM-EDS for Materials Science
Specifications shown are based on the GM chamber configuration.

Ultra-high resolution BrightBeam™ FE-SEM column

Resolution:
• 0.8 nm @ 30 keV (STEM detector)
• 1.0 nm @ 15 keV
• 1.5 nm @ 1 keV
• 1.4 nm with sample bias (BDT)
• 1.7 nm @ 500 eV

Magnification range from 1× to 2,000,000×

Essence™ integration for SEM and EDS in one interface

Elemental mapping, line scans, and point analysis included

Wide Field Optics™ for SEM navigation from 1×

Essence™ 3D Collision Model for chamber visualization and protection

MultiVac low vacuum imaging up to 500 Pa

5-axis motorized stage with max sample size of 335 × 280 × 133 mm³ and load capacity up to 8 kg

20+ chamber ports ready for detector upgrades

Included & Optional Accessories

Dual Essence™ EDS detectors for high-speed mapping

In-Column Axial detector for high-efficiency ultra-high resolution imaging

EBSD detector for crystallographic analysis from large maps to nanoscale

STEM detector for transmission imaging at sub-nanometer resolution

VisualCoder™ and SEM Expert PI for workflow automation and customization

VisualCoder for workflow automation and SEM Expert PI for advanced automation and scripting

MIRA XR GM MONO Metal (3)

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Where can you find us:

Tescan
Libušina třída 21
623 00 Brno
Czech Republic

130405923 us US 37.09024 -95.712891 25.3575 29.349345 20.67957527 42.082797 39.91384763 -33.693421 13.93320106 3.039986586 31.997988 38.050985 47.579533 30.052597 48.1485965 58.375799 54.663142 19.195447 56.975106 47.916997 50.493053 45.868592 10.79556993 44.35660598 43.2371604 55.536415 14.557577179752773 32.100937 -6.116829 -6.212299277967318 33.600194 -12.08688 23.7104 -33.471062 31.998740087 -23.69149395 43.462349 51.529848 49.1893523 49.197486 25.072375 31.075811 1.299027 40.676979 52.30150662 51.013813 35.684121 37.566531 52.246622 40.581349 39.911632 -26.1811371 41.818215 33.429928

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