FCMN 2026 at a Glance
The International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN) brings together scientists and engineers working across characterization technologies needed for nanoelectronic materials and devices. The scope spans chemical, physical, electrical, magnetic, and optical approaches, including in situ methods and real-time control and monitoring. The programme combines formal invited presentation sessions with poster sessions featuring contributed papers that report new developments in materials, structure characterization, and metrology at the nanoscale. The 2026 meeting is the 15th in the series, which began in 1995.
FCMN 2026 will also spotlight the rapid evolution of the semiconductor industry and the resulting pressure on characterization and metrology. Topics include critical reviews of materials and structure methods and nearline/inline metrology, spanning hardware advances, data analysis, and the growing role of AI and machine learning as device architectures diversify and dimensions shrink further into the nanoscale.
Invited Talk by Daniel Němeček (Tescan)
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Tuesday, March 17, 2026 | 4:30 PM
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Technical Session
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Advances in 4D-STEM for Applications in Phase Analysis and Strain Engineering
Daniel’s talk will address how 4D-STEM workflows are evolving to support the type of decisions nanoelectronics teams need to make with confidence, especially when structural differences are subtle but technologically significant. contributed papers that report new developments in materials, structure characterization, and metrology at the nanoscale. The 2026 meeting is the 15th in the series, which began in 1995.
Meet Us at FCMN 2026
If you will be in Monterey for FCMN 2026, we invite you to attend Daniel Nemecek’s session on Tuesday, March 17 at 4:30 PM. Bring your questions, compare notes with peers, and share what “repeatable” needs to mean in your metrology practice as the field moves into its next set of challenges.
For those working on phase identification, crystallinity, or strain engineering, this talk is a focused opportunity to discuss how 4D-STEM can support the next wave of nanoelectronics characterization and metrology.
Want to discuss 4D-STEM phase or strain analysis in your workflow?
Connect with our team to compare requirements, samples, and the measurement confidence you need.
