Orage™ 2, the new Ga⁺ FIB column, raises speed and consistency in TEM lamella preparation with less operator effort.
The improved spot profile of Orage™ 2 at high beam currents delivers up to 40% faster milling for TEM lamella preparation, making high-volume work more efficient and reducing the cost per sample. At the same time, clearer low-keV FIB imaging down to 500 eV ensures precise beam placement during the final cleaning step, helping users avoid the “gray-in-gray” effect and giving them full confidence in achieving ultra-thin lamellae.
With Orage™ 2 at its core, FIB SEM Tescan SOLARIS 2 builds on these advantages to accelerate fully automated lamella preparation by almost half. Automation is driven by the TEM AutoPrep™ Pro software module, which reduces operator effort by managing every step from trench milling and lift-out to the final low-keV clean on the grid. During the lift-out step, Tescan’s OptiLift™ attaches the lamella to the grid in a single, reliable motion. Together, they create a seamless, fully automated workflow for top-down, inverted, and planar geometries, perfectly suited for demanding semiconductor applications such as 3D NAND and FinFETs.