On 19–20 February 2026, the INDICO FEBID workshop brought European key opinion leaders in focused electron beam induced deposition (FEBID) and focused ion beam induced deposition (FIBID) to Frankfurt, Germany. Hosted at the Frankfurt Innovation Center for Biotechnology (FIZ) and organised by the MBN Research Center, the meeting aligned practical routes toward reliable, computer-guided 3D nanoprinting and clarified what is needed for robust, transferable process control.
Tescan participated as a technology and microscopy provider, supporting the group in evaluating the current state of the art in FEBID and FIBID, and sharing what is possible with today’s tooling and what must come next to reach industrially relevant reliability.
The COST Innovators Grant (CIG) project IG20129 “INDICO – INnovative DIgital COntrol for 3D Nanoprinting” is focused on developing a digital control tool that will be validated by comparison with dedicated FEBID and FIBID experiments. The goal is to enable 3D nanoprinting of systems relevant for industrial applications, then demonstrate the resulting capabilities and workflows to stakeholders and different target user groups of the INDICO tool.
To achieve this, INDICO connects leading European partners in FEB and FIB-based nanofabrication and materials processing with experts developing and using advanced software tools for multiscale modelling (MM). The project’s intended outcome is to enable the current generation of SEMs to deposit 3D structures with high fidelity and quality, supporting broader use of beam induced deposition as a commercially viable method for constructing nanostructures for industrially relevant applications.
Discussions focused on three core areas that matter when moving from proof-of-concept structures to repeatable nanoscale 3D printing:
Tescan’s outlook covered the technical building blocks required to make SEM-based nanofabrication more predictable and scalable:
These topics reflect a shared direction: improving predictability, strengthening in situ process monitoring, and making direct-write nanofabrication workflows easier to validate and transfer.